Scalable Growth of High-Quality Polycrystalline MoS2 Monolayers on SiO2 with Tunable Grain Sizes
论文编号:
第一作者:
J. Zhang
刊物名称:
Acs Nano
所属学科:
论文题目:
Scalable Growth of High-Quality Polycrystalline MoS2 Monolayers on SiO2 with Tunable Grain Sizes
发表年度:
2014
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期:
页:
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参与作者:
J. Zhang, H. Yu, W. Chen, X. Z. Tian, D. H. Liu, M. Cheng, G. B. Xie, W. Yang, R. Yang, X. D. Bai, D. X. Shi and G. Y. Zhang
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